Ion-beam-assisted deposition (IBAD) of hydroxyapatite coating layer on Ti-based metal substrate

A hydroxyapatite layer was formed on the surface of a Ti-based alloy by ion-beam-assisted deposition. The deposition methodology comprised of an electron beam vaporizing a pure hydroxyapatite target, while an Ar ion beam was focused on the metal substrate to assist deposition. All deposited layers were amorphous, regardless of the current level of the ion beam. The bond strength between the layer and the substrate increased steadily with increasing current, while the dissolution rate in a physiological saline solution decreased remarkably. These improvements were attributed to an increase in the Ca/P ratio of the layer. Without ion beam assistance, the Ca/P ratio was much lower than the stoichiometric HAp (Ca/P = 1.67). With ion-beam assistance, the Ca/P ratio of the layer increased presumably due to the high sputtering rate of P compared to that of Ca from the layer being coated.