Gas chromatographic analysis of trace impurities in chlorine trifluoride

The gas chromatographic determination of trace gaseous impurities in highly reactive fluorinated gaseous matrices presents unique requirements to both equipment and techniques. Especially problematic are the gases normally present in ambient air namely oxygen and nitrogen. Analysing these gases at the low microl/l (ppm) level requires special equipment and this publication describes a custom-designed system utilising backflush column switching to protect the columns and detectors. A thermal conductivity detector with nickel filaments was used to determine ppm levels of impurities in ClF3.