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Updated: Aug 7, 2026

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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Nanometer-scale resolution of strain and interdiffusion in self-assembled InAs/GaAs quantum dots
1CeNS at Sektion Physik, Ludwig-Maximilians-Universitat, 80359 Munchen, Germany.
Physical Review Letters
|September 6, 2000
Abstract:
Tomographic nanometer-scale images of self-assembled InAs/GaAs quantum dots have been obtained from surface-sensitive x-ray diffraction. Based on the three-dimensional intensity mapping of selected regions in reciprocal space, the method yields the shape of the dots along with the lattice parameter distribution and the vertical interdiffusion profile on a subnanometer scale. The material composition is found to vary continuously from GaAs at the base of the dot to InAs at the top.

