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Published on: October 29, 2016
Statistical models for carbon-nitrogen film growth
1Instituto de Fisica, Universidade Federal Fluminense, Avenida Litorainsertion marknea s/n, 24210-340 Niteroi RJ, Brazil.
Abstract:
We studied models of deposition and erosion, with two species of particles, that represent quantitatively many features of amorphous carbon-nitrogen film grown under plasma enhanced chemical vapor deposition. In the original model, the columns of the deposit are independent, and particles C and N are released with probabilities p and 1-p, respectively. An incident C particle always aggregates upon contact with the surface. An N particle annihilates with a top C particle with probability q and aggregates with probability 1-q. An N particle always annihilates with a top N. A critical line separates the regimes of growth (p>q/2) and erosion (p
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