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Statistical models for carbon-nitrogen film growth
1Instituto de Fisica, Universidade Federal Fluminense, Avenida Litorainsertion marknea s/n, 24210-340 Niteroi RJ, Brazil.
Summary
This study models amorphous carbon-nitrogen film growth, revealing how particle interactions and surface conditions affect deposition and erosion dynamics. The findings offer insights into film properties and growth kinetics.
Area of Science:
- Materials Science
- Plasma Physics
- Computational Modeling
Background:
- Amorphous carbon-nitrogen films are crucial in various applications.
- Plasma-enhanced chemical vapor deposition (PECVD) is a common method for their synthesis.
- Understanding the kinetics of film growth, including deposition and erosion, is essential for controlling film properties.
Purpose of the Study:
- To develop and validate computational models for amorphous carbon-nitrogen film growth.
- To investigate the influence of particle interactions (C and N) and surface processes on film kinetics.
- To explore the role of hydrogen in blocking surface bonds and its effect on growth.
Main Methods:
- Development of two simulation models for deposition and erosion of C and N particles.
- Analysis of particle aggregation and annihilation probabilities.
- Introduction of a parameter (alpha) to model surface bond blocking by hydrogen.
- Simulation on simple cubic lattices to assess lattice structure and spatial correlation effects.
Main Results:
- A critical line was identified, separating growth and erosion regimes based on particle probabilities (p and q).
- Model predictions for nitrogen concentration (x(N)) and growth rate (r) showed agreement with experimental data for films grown under different atmospheres.
- The second model, incorporating surface bond blocking, accurately reproduced experimental data for methane-based atmospheres.
- Surface roughness was found to increase with nitrogen concentration (x(N)).
Conclusions:
- The developed models quantitatively represent key features of amorphous carbon-nitrogen film growth.
- The models provide a framework for understanding the kinetics of film formation under PECVD conditions.
- The study confirms the validity of the models for amorphous film growth and highlights the correlation between nitrogen content and surface roughness.
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