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Related Experiment Videos

Ordering process in quenched block copolymers at low temperatures

Yokojima1, Shiwa

  • 1Division of Materials Science, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan.

Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
|December 2, 2000
PubMed
Summary

Domain growth in symmetric diblock copolymers at low temperatures follows a logarithmic law. This occurs in the strong segregation limit, driven by surface diffusion during microphase separation.

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Area of Science:

  • Polymer science
  • Materials science
  • Soft matter physics

Background:

  • Diblock copolymers undergo microphase separation into ordered nanostructures.
  • Understanding domain growth kinetics is crucial for controlling material properties.

Purpose of the Study:

  • To investigate domain growth mechanisms in symmetric diblock copolymers at low temperatures.
  • To develop and validate a nonlinear diffusion model for microphase separation.

Main Methods:

  • Phenomenological nonlinear diffusion model with order-parameter-dependent mobility.
  • Two-dimensional (2D) simulations of microphase separation.
  • Analysis of time-dependent scattering function for dynamical scaling.

Main Results:

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  • The study reveals a logarithmic growth law for domain coarsening.
  • Dynamical scaling is observed in the time-dependent scattering function.
  • Surface diffusion is identified as the dominant coarsening mechanism in the strong segregation limit.

Conclusions:

  • The developed model accurately describes domain growth in diblock copolymers.
  • Logarithmic growth kinetics are characteristic of low-temperature, strong segregation regimes.
  • Findings provide insights into controlling nanostructure formation in block copolymers.