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Related Experiment Video

Updated: Jul 25, 2026

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Published on: July 12, 2016

Nonlocal electron kinetics in a planar inductive helium discharge

Seo¹, Chung, Hong

¹Department of Physics, Korea Advanced Institute of Science and Technology, Taejon 305-701, South Korea.

Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

|December 2, 2000

Summary

Measurements in helium plasma revealed a bi-Maxwellian electron energy distribution function (EEDF) at low pressures. This indicates distinct electron groups, influenced by plasma conditions and electron interactions.

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Area of Science:

Plasma Physics
Atomic and Molecular Physics

Background:

Understanding electron behavior in plasmas is crucial for various applications.
The electron energy distribution function (EEDF) dictates plasma properties.
Helium, a non-Ramsauer gas, is used in this planar inductive plasma study.

Purpose of the Study:

To measure the EEDF in a helium planar inductive plasma.
To investigate factors influencing EEDF formation, particularly at low pressures.
To calculate the electron energy diffusion coefficient using simulations.

Main Methods:

Electron energy distribution function (EEDF) measurement using the ac superposition method.
Helium pressure range: 10-100 mTorr.
Two-dimensional simulation to calculate the electron energy diffusion coefficient.

Main Results:

A bi-Maxwellian EEDF was observed at low helium pressures (< 20 mTorr).
This bi-Maxwellian distribution features a distinct low-energy electron group.
Factors contributing to the bi-Maxwellian EEDF include capacitive field effects, ambipolar potential, and low electron-electron collision frequency.

Conclusions:

The bi-Maxwellian EEDF in helium plasma is influenced by electron cooling, heating rates, and confinement.
Electron-electron collision frequency, estimated via total electron bounce frequency, plays a key role.
The findings provide insights into electron dynamics in low-pressure inductive plasmas.