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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Nonlocal electron kinetics in a planar inductive helium discharge
1Department of Physics, Korea Advanced Institute of Science and Technology, Taejon 305-701, South Korea.
Abstract:
A measurement of the electron energy distribution function (EEDF) using the ac superposition method is done over a helium pressure range of 10-100 mTorr in a planar inductive plasma, and the electron energy diffusion coefficient which describes the electron heating is calculated based on the same discharge conditions using a two-dimensional simulation. It is found that the measured EEDF shows a bi-Maxwellian distribution with a low-energy electron group at low pressures below 20 mTorr even in the inductive discharge using helium of the non-Ramsauer gas. The major factors which can affect the EEDF formation are investigated. In particular, the concept of the total electron bounce frequency, i.e., the electron residence time, is introduced as an indicator of how the electron-electron collision affects the EEDF shape. As a result, it is shown that the observed bi-Maxwellian distribution at low pressures is attributed to the combined effects of the formation of low-energy electrons through the cooling mechanism of energetic electrons enhanced by the capacitive field, the low heating rate of the low-energy electrons, the confinement of low-energy electrons by the ambipolar space potential, and the low electron-electron collision frequency which can be estimated from the total electron bounce frequency presented in this paper.
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