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Frost heave in physisorbed films: vapor flow and substrate effects
1Department of Physics, University of Missouri-Kansas City, 257 Robert H. Flarsheim Hall, 5100 Rockhill Road, Kansas City, Missouri 64110, USA.
Abstract:
The magnitude of vapor flow accompanying the surface-melted liquid flow in physisorbed multilayer films due to thermomolecular pressures was estimated. It was found that the vapor flow is significant compared to the flow of the surface-melted liquid in thick films. As the flows continue, the film thickness profile evolves into one determined by a dynamic equilibrium of vapor pressure. The flow of surface-melted liquid stops when the dynamic equilibrium is reached.