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Entangled-state lithography: tailoring any pattern with a single state
G Björk1, L L Sánchez-Soto, J Söderholm
1Departamento de Optica, Facultad de Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain. gunnarb@ele.kth.se
Physical Review Letters
|June 1, 2001
Abstract:
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) x (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.
