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Related Experiment Videos

Imaging of three-dimensional objects in emission electron microscopy.

S A Nepijko1, N N Sedov, O Schmidt

  • 1Institute of Physics, University Mainz, Staudingerweg 7, 55099 Mainz, Germany. nepijko@yahoo.com

Journal of Microscopy
|June 26, 2001
PubMed
Summary

Emission electron microscopy (EEM) can distort particle size due to potential differences. This study quantifies these distortions for spherical particles, providing methods to determine their true size and work function from EEM images.

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Area of Science:

  • Surface science
  • Electron microscopy
  • Materials characterization

Background:

  • Emission electron microscopy (EEM) is used to study surface properties.
  • Potential relief and contact potential differences can distort observed particle dimensions in EEM.
  • Accurate size and work function determination is crucial for materials analysis.

Purpose of the Study:

  • To investigate the impact of potential relief and contact potential differences on particle imaging in EEM.
  • To develop methods for correcting size distortions observed in EEM images.
  • To enable accurate determination of particle size and work function relative to the substrate.

Main Methods:

  • Theoretical estimation of potential effects on spherical particles in EEM.

Related Experiment Videos

  • Mathematical modeling of image distortions caused by work function differences.
  • Development of formulae to correct apparent particle size.

    • Main Results:

    • Observed particle size in EEM can be magnified or reduced based on work function relationships.
    • The study provides quantitative formulae to estimate these size variations.
    • Methods are presented to recover the real particle size and relative work function from EEM data.

    Conclusions:

    • Potential relief and contact potentials significantly affect EEM imaging of particle dimensions.
    • The developed formulae and methods allow for accurate characterization of particle size and work function.
    • This research enhances the reliability of EEM for quantitative surface analysis.