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Related Experiment Videos

Improved O3/H2O2 oxidation process for wastewater reclamation.

M Yang1, Y Zhang, R Qi

  • 1State Key Lab. of Environmental Aquatic Chemistry, RCEES, P.O. Box 2871, Beijing, 100085 China.

Water Science and Technology : a Journal of the International Association on Water Pollution Research
|July 5, 2001
PubMed
Summary

This study presents an efficient two-step ozone/hydrogen peroxide (O3/H2O2) oxidation system for electronics industry wastewater reclamation. The optimized system reuses waste gas and reduces O3 consumption by 40%.

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Area of Science:

  • Environmental Chemistry
  • Chemical Engineering
  • Water Treatment Technologies

Background:

  • Electronics industries generate wastewater containing persistent organic pollutants.
  • Conventional single-step oxidation systems may lack efficiency and optimal resource utilization.

Purpose of the Study:

  • To develop and evaluate a continuous two-step ozone/hydrogen peroxide (O3/H2O2) oxidation system for wastewater reclamation.
  • To optimize the H2O2 to O3 ratio for effective total organic carbon (TOC) removal.
  • To enhance resource efficiency by reusing waste gas and controlling oxidant dosage.

Main Methods:

  • A continuous two-step O3/H2O2 oxidation system was designed, incorporating waste gas reuse via an ejector.
  • An oxidation-reduction potential (ORP) monitor was used for automatic H2O2 dosage adjustment to optimize the H2O2/O3 ratio.

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  • Ion exchange resin was employed to remove organic acids produced during oxidation.
  • The system's effectiveness was tested using isopropanol (IPA), dimethyl sulfoxide (DMSO), and N-methyl-2-pyrrolidone (NMP) as model pollutants.

    • Main Results:

    • The two-step system demonstrated higher efficiency in TOC removal compared to single-step processes.
    • Optimum H2O2/O3 ratios were identified, with specific ORP ranges (250-300 mV or 800-900 mV) suitable for control.
    • Pollutant treatability correlated with the highest occupied molecular orbital energy, in the order IPA << DMSO < NMP.
    • The developed system achieved approximately 40% O3 savings through H2O2 dosing control and waste O3 reuse.

    Conclusions:

    • The continuous two-step O3/H2O2 oxidation system is an effective and resource-efficient method for reclaiming wastewater in the electronics industry.
    • Automated ORP monitoring and waste gas recycling significantly improve process performance and reduce oxidant consumption.
    • The findings provide a viable approach for sustainable industrial wastewater treatment.