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Morphology transition during low-pressure chemical vapor deposition
Y P Zhao1, J T Drotar, G C Wang
1Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, USA.
Physical Review Letters
|October 3, 2001
Abstract:
Assuming a reemission model, we have studied, in detail, the effect of sticking coefficient on the morphology evolution in low-pressure chemical vapor deposition processes. We have shown that the surface morphology changes from a self-affine fractal to a columnarlike morphology with increasing sticking coefficient, which agrees qualitatively with experimental observations.