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Energy dissipation in atomic force microscopy and atomic loss processes
P M Hoffmann1, S Jeffery, J B Pethica
1Department of Physics, Wayne State University, 666 W. Hancock, Detroit, Michigan 48201, USA. hoffmann@physics.wayne.edu
Abstract:
Atomic scale dissipation is of great interest in nanomechanics and atomic manipulation. We present dissipation measurements with a linearized, ultra-small amplitude atomic force microscope which is capable of measuring dissipation at chosen, fixed separations. We show that the dynamic dissipation in the noncontact regime is of the order of a few 10-100 meV per cycle. This dissipation is likely due to the motion of a bistable atomic defect in the tip-surface region. In the contact regime we observe dc hysteresis associated with nanoscale plasticity. We find the hysteretic energy loss to be 1 order of magnitude higher for a silicon surface than for copper.