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Moving beyond molecules: patterning solid-state features via dip-pen nanolithography with sol-based inks.

Ming Su1, Xiaogang Liu, Shu-You Li

  • 1Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA.

Journal of the American Chemical Society
|February 21, 2002
PubMed
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This study introduces a novel dip-pen nanolithography method for creating composite nanostructures. This technique enables precise patterning of inorganic materials on silicon surfaces at the nanoscale.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Chemistry

Background:

  • Dip-pen nanolithography (DPN) traditionally uses organic molecules.
  • Direct patterning of solid-state materials with DPN is challenging.
  • Existing methods often require external driving forces like applied fields.

Purpose of the Study:

  • To develop a new DPN-based method for direct patterning of organic/inorganic composite nanostructures.
  • To demonstrate the feasibility of depositing solid-state materials using DPN.
  • To achieve sub-200 nm resolution patterning without external driving forces.

Main Methods:

  • Utilized dip-pen nanolithography (DPN) with a modified atomic force microscopy (AFM) tip.
  • Employed metal precursors undergoing hydrolysis in the ink-surface meniscus.

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  • Developed hybrid inks comprising inorganic salts and amphiphilic block copolymer surfactants.

    • Main Results:

    • Successfully patterned Al2O3, SiO2, and SnO2 nanostructures on silicon and oxidized silicon substrates.
    • Achieved controlled writing of dot and line arrays with feature sizes below 200 nm.
    • Demonstrated DPN's capability for depositing solid-state materials via chemisorption.

    Conclusions:

    • The new DPN method enables direct patterning of inorganic nanostructures.
    • This approach expands DPN applications to solid-state material deposition.
    • The technique offers high-resolution patterning without external fields, relying on chemisorption.