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Individual leaf development in Arabidopsis thaliana: a stable thermal-time-based programme.

Christine Granier1, Catherine Massonnet, Olivier Turc

  • 1Institut National de la Recherche Agronomique, Ecole Nationale Supérieure d'Agronomie, Laboratoire d'Ecophysiologie des Plantes sous Stress Environnementaux, Montpellier, France. granier@ensam.inra.fr

Annals of Botany
|July 9, 2002
PubMed
Summary

Thermal time modeling accurately predicts Arabidopsis thaliana leaf development across varying temperatures. This method unifies plant growth analysis, enabling precise experimental planning and treatment comparisons for leaf initiation and expansion.

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