Related Experiment Video
Updated: Apr 26, 2026
07:36
Fabricating Nanogaps by Nanoskiving
Published on: May 13, 2013
10.8K
Fabrication of a nano-scale gap by selective chemical deposition
Lan Huang1, Lina Xu, Haiqin Zhang
1National Laboratory of Molecular and Biomolecular Electronics, Southeast University, Nanjing 210096, People's Republic of China. huanglan822@yahoo.com
Chemical Communications (Cambridge, England)
|July 18, 2002
Abstract:
An electrode nanogap of 45 nm has been prepared by a new method in which the initial gap of 1-2 microns obtained by conventional lithography was shortened by selective chemical deposition of copper onto the electrodes.
