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High-resolution imaging ellipsometer.

Qiwen Zhan1, James R Leger

  • 1Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis 55455, USA. qzhan@ece.umn.edu

Applied Optics
|August 3, 2002
PubMed
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We developed a new high-resolution imaging ellipsometer. This advanced instrument achieves 0.5 micrometer spatial resolution for precise material characterization.

Area of Science:

  • Optical Metrology
  • Nanoscale Imaging
  • Materials Science

Background:

  • Ellipsometry is a powerful technique for thin film characterization.
  • Traditional ellipsometry provides point measurements, limiting spatial analysis.
  • High-resolution imaging is crucial for understanding material variations.

Purpose of the Study:

  • To develop a novel imaging ellipsometer with high spatial resolution.
  • To demonstrate the capability of 2D ellipsometric signal measurement.
  • To enable precise characterization of material properties with nanoscale resolution.

Main Methods:

  • Utilized a high-numerical-aperture (NA) objective lens for enhanced light collection.
  • Implemented spatial filtering at the objective's pupil plane for 2D imaging.

Related Experiment Videos

  • Developed Richards-Wolf vectorial diffraction and geometrical optics models for simulation.
  • Calibrated the system using patterned polymethyl methacrylate thickness profiles.

    • Main Results:

    • Achieved a sensitivity of 5 Angstroms for thickness measurements.
    • Obtained a spatial resolution of approximately 0.5 micrometers at 632.8 nm.
    • Successfully demonstrated the measurement of refractive index variations with high spatial resolution.

    Conclusions:

    • The novel imaging ellipsometer offers unprecedented spatial resolution for ellipsometric measurements.
    • This instrument is valuable for detailed characterization of patterned materials and thin films.
    • Enables advanced nanoscale imaging and metrology in materials science.