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Related Experiment Videos

Microellipsometer with radial symmetry.

Qiwen Zhan1, James R Leger

  • 1Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis 55455, USA. qzhan@ece.umn.edu

Applied Optics
|August 3, 2002
PubMed
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A new microellipsometer achieves high spatial resolution using a high-numerical-aperture lens and radial symmetry for improved signal-to-noise. This technique accurately measures thin film thickness and surface profiles, validated against standard methods.

Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Microellipsometry is crucial for characterizing thin films and microstructures.
  • Existing techniques face limitations in spatial resolution and signal-to-noise ratio.
  • Need for advanced optical metrology tools for nanoscale analysis.

Purpose of the Study:

  • To develop and demonstrate a novel microellipsometer with enhanced spatial resolution and signal quality.
  • To enable precise, non-contact measurement of thin film properties and surface topography.
  • To validate the performance of the new instrument against established methods.

Main Methods:

  • Utilized a spatially filtered high-numerical-aperture (NA) lens for large-angle illumination.
  • Implemented half-wave plates and a birefringent cube for radial symmetry in the ellipsometric signal.

Related Experiment Videos

  • Employed a He-Ne laser source and a 0.8 NA objective lens for 0.5 micrometer spatial resolution.
  • Performed scanning ellipsometry to acquire microstructural images.

    • Main Results:

    • Achieved a radial symmetry in the ellipsometric signal, improving signal-to-noise ratio.
    • Demonstrated high spatial resolution of 0.5 micrometers for ellipsometric measurements.
    • Experimental data on SiO2 samples showed excellent agreement with spectroscopic ellipsometer results.
    • Successfully derived surface profiles of photoresist microstructures, comparable to stylus profiler data.

    Conclusions:

    • The novel microellipsometer offers superior performance in spatial resolution and signal-to-noise ratio.
    • This technique provides accurate characterization of thin film thickness and microstructure topography.
    • The developed instrument is a valuable tool for advanced optical metrology in materials science and nanotechnology.