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Fast surface profiler by white-light interferometry by use of a new algorithm based on sampling theory.

Akira Hirabayashi1, Hidemitsu Ogawa, Katsuichi Kitagawa

  • 1Yamaguchi University, Department of Computer Science and Systems Engineering, Faculty of Engineering, Yamaguchi, Japan. a-hira@csse.yamaguchi-u.ac.jp

Applied Optics
|August 29, 2002
PubMed
Summary

A new surface-profiling algorithm enhances white-light interferometry speed using sampling theory. This method achieves faster scanning speeds and high height resolution for advanced surface measurements.

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Area of Science:

  • Optical Metrology
  • Surface Metrology
  • Sampling Theory

Background:

  • White-light interferometry is a key technique for high-resolution surface profiling.
  • Conventional methods face limitations in scanning speed due to sampling constraints.

Purpose of the Study:

  • To develop a faster surface-profiling algorithm for white-light interferometry.
  • To improve scanning speed while maintaining high height resolution.

Main Methods:

  • Development of a generalized sampling theorem for white-light interferograms.
  • Reconstruction of the squared-envelope function from sampled interferogram data.
  • Algorithm implementation utilizing an optical filter (600 nm center wavelength, 60 nm bandwidth).

Main Results:

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  • The proposed algorithm extends the sampling interval to 1.425 microm, 6-14 times wider than conventional systems.
  • Achieved the world's fastest scanning speed of 80 microm/s in a commercial system.
  • Demonstrated a height resolution of approximately 10 nm over a measurement range exceeding 100 microm.

Conclusions:

  • The novel algorithm significantly enhances the speed of white-light interferometry-based surface profiling.
  • The method offers a practical solution for rapid, high-resolution surface measurements.
  • The developed algorithm enables faster and more efficient surface characterization.