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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Contact resistance in metal-molecule-metal junctions based on aliphatic SAMs: effects of surface linker and metal

Jeremy M Beebe1, Vincent B Engelkes, Larry L Miller

  • 1Department of Chemistry, University of Minnesota, Minneapolis, Minnesota 55455, USA.

Journal of the American Chemical Society
|September 19, 2002
PubMed

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