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Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition
Published on: December 21, 2015
Preparation of a mesoporous silicon boron nitride via a non-aqueous sol-gel route
Fei Cheng1, Berangere Toury, Frédéric Lefebvre
1Department of Chemistry, University of Hull, Cottingham Road, Hull, UK HU6 7RX.
Chemical Communications (Cambridge, England)
|February 15, 2003
Abstract:
A silicon boron imide based gel Si3B(NH)x(NH2)y(NMe2)z was prepared via catalytic ammonolysis of tris[tris(dimethylamino)silylamino]boron B[HNSi[N(CH3)2]3]3; pyrolysis of the gel under ammonia at 1,000 degrees C gives a mesoporous silicon boron nitride with high surface area and narrow pore size distribution.
