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Profilometry based on two-photon absorption in a silicon avalanche photodiode.

Yosuke Tanaka1, Naoya Sako, Takashi Kurokawa

  • 1Department of Electrical and Electronic Engineering, Faculty of Technology, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei-shi, Tokyo 184-8588, Japan. tyosuke@cc.tuat.ac.jp

Optics Letters
|March 28, 2003
PubMed
Summary

A new profilometry technique uses two-photon absorption in silicon avalanche photodiodes for precise measurements. This method achieves a broad dynamic range, spanning millimeters to tens of meters.

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Area of Science:

  • Optics and Photonics
  • Semiconductor Devices

Background:

  • Profilometry is crucial for surface characterization.
  • Existing methods may have limitations in dynamic range or precision.

Purpose of the Study:

  • To introduce a novel profilometry method utilizing two-photon absorption.
  • To demonstrate a wide dynamic range for surface measurements.

Main Methods:

  • Employing two-photon absorption in a silicon avalanche photodiode.
  • Experimental validation using a fiber-optic Mach-Zehnder interferometer.

Main Results:

  • Successful demonstration of the proposed profilometry principle.
  • Achieved a wide dynamic measurement range from millimeters to tens of meters.

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Conclusions:

  • The novel two-photon absorption profilometry method offers a significant advancement.
  • This technique provides a versatile solution for diverse measurement scales.