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Analysis, search, and classification for reflective ring-field projection systems.

Matthieu F Bal1, Florian Bociort, Joseph J M Braat

  • 1Delft University of Technology, Lorentzweg 1, Delft 2628 CJ, The Netherlands. M.F.Bal@tnw.tudelft.nl

Applied Optics
|May 10, 2003
PubMed
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Extreme ultraviolet (EUV) lithography design is constrained by geometrical obstruction. This study presents a search method to identify all possible unobstructed EUV lithography system configurations for optimization.

Area of Science:

  • Optics and photonics
  • Semiconductor manufacturing technology

Background:

  • Extreme ultraviolet (EUV) lithography relies on complex reflective ring-field projection systems.
  • System design is inherently limited by geometrical obstructions within the parameter space.

Purpose of the Study:

  • To analyze and classify unobstructed design domains in EUV lithography systems.
  • To develop an effective search methodology for identifying viable system configurations.

Main Methods:

  • Employed an exhaustive search method based on paraxial analysis.
  • Validated findings through comparison with finite ray tracing simulations.

Main Results:

  • Identified and classified specific domains of unobstructed configurations.

Related Experiment Videos

  • The paraxial analysis method effectively determines all possible design forms.
  • Provided useful starting configurations for optical system optimization.

    • Conclusions:

    • The developed search method is effective for exploring EUV lithography design space.
    • This approach aids in finding optimal starting points for complex optical system design and optimization.