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W/SiC x-ray multilayers optimized for use above 100 keV.

David L Windt1, Soizik Donguy, Charles J Hailey

  • 1Columbia Astrophysics Laboratory, 550 West 120 Street, New York, New York 10027, USA. windt@astro.columbia.edu

Applied Optics
|May 10, 2003
PubMed
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We developed new W/SiC multilayer coatings for hard X-ray telescopes. These coatings demonstrate excellent stability and reflectance for energies up to 200 keV.

Area of Science:

  • Materials Science
  • Optics
  • Astrophysics

Background:

  • Hard X-ray reflective coatings are crucial for advanced astronomical telescopes.
  • Previous multilayer systems faced limitations in stability and energy range.

Purpose of the Study:

  • To develop and characterize novel depth-graded multilayer coatings for hard X-ray applications.
  • To evaluate the performance of Tungsten/Silicon Carbide (W/SiC) multilayers for energies between 100-200 keV.

Main Methods:

  • Grazing-incidence X-ray reflectance measurements at 8 keV to assess interface properties and stability.
  • Synchrotron radiation utilized for hard X-ray reflectance measurements (150-170 keV) and optical constant determination (120-180 keV).
  • Comparison of W/SiC multilayers with previously studied W/Si and W/B4C films.

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Main Results:

  • The new W/SiC multilayers exhibit suitable properties for hard X-ray reflective coatings.
  • Characterization confirmed good temporal and thermal stability of the W/SiC structures.
  • Optical constants were derived, enabling accurate modeling of hard X-ray reflectance.

Conclusions:

  • The developed W/SiC multilayers show significant promise for future hard X-ray telescopes.
  • These findings advance the development of sensitive instruments for observing high-energy cosmic phenomena.
  • W/SiC multilayers represent an improvement over previous W/Si and W/B4C systems for hard X-ray optics.