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Substrate-strain-induced tunability of dense wavelength-division multiplexing thin-film filters
Rémy Parmentier1, Michel Lequime
1Institut Fresnel, Unité Mixte de Recherche 6133 du Centre National de la Recherche Scientifique, Ecole Nationale Supérieure de Physique de Marseille, Domaine Universitaire de Saint-Jérôme, 13397 Marseille Cedex 20, France. remy.parmentier@fresnel.fr
Abstract:
Classic dense wavelength-division multiplexing thin-film filters can be spectrally tuned through the substrate's strain. We analyze the theoretical shift of the design wavelength of a narrow-bandpass filter when uniform, uniaxial compressive stress is applied to the substrate, and we compare calculated sensitivity with experimental data. We measure the transmittance shape of a 200-GHz standard filter for several loading cases to quantify the increase of insertion losses.