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Streptomycin-resistant mutant production in a continuous-flow UV mutation device.

G Kai1, A S Weber

  • 1Department of Civil Engineering, State University of New York, Buffalo 14260.

Journal of Industrial Microbiology
|September 1, 1991
PubMed
Summary

A novel continuous-flow device for UV-induced mutation was developed, achieving mutation frequencies comparable to batch methods. This system enhances mutant production by three orders of magnitude over spontaneous mutation.

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Area of Science:

  • Microbiology
  • Biotechnology
  • Genetic Engineering

Background:

  • UV-induced mutagenesis is a key tool for genetic variation.
  • Conventional batch methods for UV mutagenesis can be time-consuming and labor-intensive.
  • Efficient methods for generating mutant strains are crucial for research and development.

Purpose of the Study:

  • To conceptualize and test a continuous-flow UV-induced mutation device.
  • To evaluate the efficiency of the device for producing streptomycin-resistant mutants.
  • To compare the performance of the continuous-flow system with conventional batch methods.

Main Methods:

  • Development of a continuous-flow device integrating cultivation, UV irradiation, and mutant reproduction.
  • Utilizing streptomycin resistance as a selectable marker for mutant identification.

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  • Quantification of mutation frequency under specific experimental conditions.

    • Main Results:

    • The continuous-flow UV-induced mutation device was successfully conceptualized and tested.
    • Mutation frequencies for streptomycin resistance ranged from 10(-4) to 10(-5) cfu/ml.
    • The observed mutation frequencies are comparable to conventional batch UV mutation methods.

    Conclusions:

    • The continuous-flow device offers an efficient alternative for UV-induced mutagenesis.
    • The system achieved a significant increase (3 orders of magnitude) in mutation frequency compared to spontaneous mutation.
    • This technology holds promise for accelerating the generation of mutant strains in various applications.