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Heat treatment for reduction of surface roughness on holographic gratings
Rabi Rabady1, Dmitry Frankstein, Ivan Avrutsky
1Department of Electrical and Computer Engineering, Wayne State University, Detroit, Michigan 48202, USA. ae5248@wayne.edu
Abstract:
Controlled postdevelopment heat treatment of the photoresist polymer used in the preparation of holographic gratings has been shown to enhance the diffraction efficiency of gratings and reduce the scattering losses. We prove this effect by analyzing the resonant reflection spectra of a waveguide grating and observing the reduction in the arc-shaped light scattering associated with the excitation of waveguide modes.
