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20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected]
Weilun Chao1, Erik Anderson, Gregory P Denbeaux
1Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720-8199, USA. wlchao@lbl.gov
Optics Letters
|November 1, 2003
Abstract:
A spatial resolution of 20 nm is demonstrated at 2.07-nm wavelength by use of a soft x-ray microscope based on Fresnel zone plate lenses and partially coherent illumination. Nanostructural test patterns, formed by sputtered multilayer coatings and transmission electron microscopy thinning techniques, provide clear experimental results.