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Quantitative analysis of trace bulk oxygen in silicon wafers using an inert gas fusion method

Hiroshi Uchihara1, Masahiko Ikeda, Taketoshi Nakahara

  • 1HORIBA Application Center; 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan.

Analytical Sciences : the International Journal of the Japan Society for Analytical Chemistry
|December 3, 2003
PubMed

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