Surface plasmon resonance spectroscopy based on evanescent field treatment

The reflectance in a surface plasmon resonance (SPR) curve can be expressed in terms of the integration of the product between the evanescent electric field and the imaginary part of the dielectric constant of all absorbing media. The evanescent field in the metal film consists of two fields, one originating at the prism/metal interface and the other at the metal/dielectric interface. Near the resonance angle, the evanescent field strength at the metal/dielectric interface is much greater than that at the prism/metal interface. The evanescent field in dielectric medium has a single origin at the metal/dielectric interface. Due to the optical enhancement at the interface, the amplitude of the evanescent electric field in the dielectric medium is much greater than that in the metal film. This field, however, is not being utilized in conventional SPR where changes in the refractive index of the nonabsorbing dielectric media are of interest. In a system with an absorbing dielectric medium, the absorption of the medium is enhanced by the strong evanescent electric field. The evanescent field distributions in the metal film and in the dielectric medium are significantly altered by the absorbing dielectric, which results in shifting of the resonance angle, increasing of the reflectance, and broadening of the SPR curve. Since the absorption contribution from the absorbing dielectric can be separated from that of the metal film via knowledge of evanescent field distribution, an in-depth analysis of the SPR curve of an absorbing medium and its relationship with the material characteristics are possible.