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Scanning work function microscopy
1Institut für Oberflächen- und Schichtanalytik, Universität Kaiserslautern, D-67653, Kaiserslautern, Germany.
Analytical and Bioanalytical Chemistry
|June 1, 1996
Summary
Work function microscopy uses electron beams to map surface potential variations. This technique offers high resolution for detailed surface analysis and chemical microanalysis.
Area of Science:
- Surface Science
- Materials Science
- Analytical Chemistry
Background:
- Surface properties significantly influence material behavior and chemical reactivity.
- Accurate mapping of surface potential variations is crucial for understanding surface phenomena.
- Existing techniques may lack the required resolution or sensitivity for detailed microanalysis.
Purpose of the Study:
- To describe the performance and integration of the "onset" technique for work function microscopy.
- To demonstrate the potential of work function microscopy for structural and chemical microanalysis.
- To showcase applications in surface reaction analysis and sputter depth profiling.
Main Methods:
- Local excitation of sample surfaces using a focused, raster-scanned keV electron beam.
- Monitoring work function variations (ΔΦ) via shifts in secondary electron emission onset energy.
- Integration of work function microscopy with scanning Auger microprobes for correlative analysis.
Main Results:
- The "onset" technique effectively monitors work function variations across sample surfaces.
- Demonstrated lateral resolution down to 10 nm for surface microanalysis.
- Achieved a detection limit below 10⁻² of a monolayer for surface species.
Conclusions:
- Work function microscopy is a highly surface-sensitive technique for microanalysis.
- The technique provides valuable insights into surface reactions and material composition.
- Scanning work function microscopy offers significant potential for advanced materials characterization.