Investigation of the surface topography for the characterization of microstructures of amorphous SiN(x)-coatings

SiN(x)-coatings have been deposited by reactive magnetron sputtering. Gas pressure and film thickness have been varied. Scanning electron microsopic views of the cross sections show a columnar structure as well as polycrystalline films varying with deposition parameters. For quantitative comparisons of the film morphology an average column diameter has been used as a characteristic value obtained from TEM images. Similar results have been obtained by scanning tunneling microscope avoiding a large expenditure of preparation. Scanning tunneling microscopy is suitable for investigations of the fractal nature of top surface of thin films and to determine the height function of thin SiN(x)-coatings on silicon wafers directly. Computer simulations of sputter processes allow to discuss the evolution of microstructures qualitatively.