Prepolymer film growth by adsorption out of solution on silicon and aluminiumAn atomic force microscopic stud

A cyanurate prepolymer has been applied to smooth silicon wafers or to distinctly structured aluminium coatings. The surface composition of the substrates has been investigated by X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES) and ellipsometry. The application methods, spin coating and dip coating represent adsorption by a technical process exerting significant shear stresses or nearly equilibrated conditions, respectively. The mean tickness of the prepolymer film has been adjusted by variation of the concentration of the solution and checked by ellipsometry. Atomic Force Microscopy (AFM) monitored the development of the respective film morphologies of all 4 systems (silicon/aluminium, spin/dip coating) in the mean film thickness range from 1 to 50 nm.