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Depth profiling by ARXPS in surface analysis.

H Fischer1, R Svagera, H Ebel

  • 1Institut für Angewandte und Technische Physik, Technische Universität Wien, Wiedner Hauptstrasse 8-10, A-1040, Wien, Austria.

Analytical and Bioanalytical Chemistry
|October 1, 1995
PubMed
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This study introduces a new method for nondestructive depth profiling of solid surfaces using angle-resolved X-ray photoelectron spectroscopy (ARXPS). The developed algorithms accurately analyze surface composition and segregation in materials like Pt-Ni and Fe-S.

Area of Science:

  • Materials Science
  • Surface Science
  • Analytical Chemistry

Background:

  • Nondestructive depth profiling is crucial for understanding near-surface properties of solids.
  • Accurate characterization of elemental composition and segregation at surfaces is essential for material performance.

Purpose of the Study:

  • To develop and validate a method for nondestructive depth profiling in near-surface regions of solids.
  • To establish algorithms for evaluating measured data from angle-resolved X-ray photoelectron spectroscopy (ARXPS).

Main Methods:

  • Development of algorithms based on standard profiles with free parameters.
  • Adjustment of algorithms to ARXPS data using least squares fits.
  • Application of depth profile analyses and segregation studies on Pt-Ni and Fe-S specimens.

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Main Results:

  • Successful implementation of a nondestructive depth profiling method.
  • Accurate evaluation of measured ARXPS data through least squares fitting.
  • Demonstrated capability for depth profile analysis and segregation studies on specific metal alloys and compounds.

Conclusions:

  • The developed method provides a reliable approach for nondestructive depth profiling.
  • The algorithms are effective for analyzing ARXPS data and understanding surface segregation.
  • This technique is applicable to various solid materials, including Pt-Ni and Fe-S.