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High-performance EUV/soft X-ray ellipsometry system using multilayer mirrors
T Kawamura1, J J Delaunay, H Takenaka
1NTT Basic Research Laboratories, 3-1 Morinosato, Wakamiya, Atsugi, Kanagawa 243-01, Japan.
Abstract:
A high-performance EUV/soft X-ray ellipsometry system using multilayer mirrors has been developed. A couple of multilayer mirrors were used for the polarizer, and two multilayer mirrors were used for the rotating analyser. The multilayer mirrors were optimized to obtain a medium extinction of about 2000. An extinction ratio of the polarizer up to 10(4) can be achieved by using two multilayer mirrors, and the calculated reflectivity was more than 35%. The calculated error of the optical elements reveals that the error of the polarizer and misalignment optical parts is mainly of the first order, and that of the analyser is of the second order.
