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A compact UHV X-ray diffractometer for studying surfaces and interfaces.

Y Fujii1, T Nakamura, M Kai

  • 1Faculty of Engineering, Kobe University, Rokkodai, Nada, Kobe 657-8501, Japan.

Journal of Synchrotron Radiation
|July 21, 2004
PubMed
Summary
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A new compact ultra-high-vacuum X-ray diffractometer enables in situ surface analysis. This surface glancing X-ray scattering instrument successfully observed crystal growth, paving the way for laboratory-based preliminary experiments.

Area of Science:

  • Materials Science
  • Surface Science
  • Condensed Matter Physics

Background:

  • Surface analysis requires specialized equipment for in situ observation.
  • Existing methods may necessitate large facilities or complex setups.

Purpose of the Study:

  • To construct a compact ultra-high-vacuum X-ray diffractometer for surface glancing X-ray scattering.
  • To enable in situ observation of crystal surface growth and structure.

Main Methods:

  • Designed and built a compact UHV system integrating an 18 kW rotating-anode X-ray source and UHV specimen chamber on a single optical table.
  • Equipped the chamber with Be windows, external specimen orientation control, heating capabilities (up to 773 K), and two evaporation cells.
  • Utilized the instrument for surface glancing X-ray scattering experiments.

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Main Results:

  • Successfully observed the surface of a mechanically polished Ag sample.
  • Achieved in situ observation of layer-by-layer growth of a PbSe(111) surface.
  • Demonstrated the capability for real-time surface analysis under UHV conditions.

Conclusions:

  • The developed compact UHV X-ray diffractometer is effective for in situ surface analysis.
  • The instrument facilitates preliminary experiments using laboratory sources before synchrotron measurements.
  • This device offers a valuable tool for studying crystal growth dynamics at surfaces.