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Related Experiment Videos

Electron attachment to gas-phase uracil.

S Denifl1, S Ptasińska, G Hanel

  • 1Institut für Ionenphysik, Leopold-Franzens Universität Innsbruck, Technikerstr. 25, A-6020 Innsbruck, Austria.

The Journal of Chemical Physics
|July 23, 2004
PubMed
Summary

Dissociative electron attachment to uracil primarily forms (U-H)- ions, with the highest intensity resonance at 1.01 eV. Researchers also identified other fragments and a parasitic process affecting measurements.

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Area of Science:

  • Physical Chemistry
  • Chemical Physics
  • Molecular Physics

Background:

  • Uracil is a fundamental component of nucleic acids.
  • Understanding electron interactions with uracil is crucial for radiation chemistry and biology.
  • Dissociative electron attachment (DEA) is a key process for molecular fragmentation.

Purpose of the Study:

  • To investigate the dissociative electron attachment (DEA) to gas-phase uracil.
  • To identify negative ions and fragment patterns formed.
  • To determine cross sections and compare experimental data with theoretical calculations.

Main Methods:

  • Utilized a crossed electron/molecule beam apparatus.
  • Studied DEA to uracil for electron energies from 0 to 14 eV.

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  • Employed high-level ab initio calculations (G2MP2 method) for comparison.

    • Main Results:

    • The most abundant negative ion observed was (U-H)-, with a prominent resonance at 1.01 eV.
    • Multiple peaks in the (U-H)- anion yield suggest the formation of different isomers.
    • Twelve other fragment ions were detected with lower cross sections; no parent ion (U-) was observed.
    • A parasitic process involving SF6 and CCl4 calibrant gases was identified, causing a sharp peak near 0 eV.

    Conclusions:

    • The study provides a detailed characterization of DEA to uracil.
    • Experimental findings are supported by theoretical calculations, offering insights into ion formation mechanisms.
    • The identification of the (U-H)- ion and other fragments advances the understanding of electron-induced processes in uracil.