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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Ion-assisted sputter deposition

John S Colligon1

  • 1Surface Coatings Laboratory, Department of Chemistry and Materials, Manchester Metropolitan University, Manchester M1 5GD, UK.

Philosophical Transactions. Series A, Mathematical, Physical, and Engineering Sciences
|August 13, 2004
PubMed

Abstract:

A review of the development of the ion-assisted sputter-deposition process is given. The special features of thin films produced by this technique are outlined and some main applications and future developments are discussed.

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