Deposition of size-selected metal clusters generated by magnetron sputtering and gas condensation: a progress review

This paper presents a topical review of the production and deposition of size-selected metal clusters generated by magnetron sputtering and gas condensation. Clusters with up to 75,000 atoms can be obtained by controlling the gas pressure in the sputtering source, prior to size selection with a novel (time-of-flight) mass filter. The clusters are deposited on the model graphite substrate to study the cluster-surface interaction. Two regimes for cluster deposition have been identified at elevated impact energies: (i) 'pinning' (ca. 10 eV per atom) and (ii) implantation (ca. 100 eV per atom). Of particular importance is the pinning regime, since this allows the fabrication of monodispersed cluster arrays, which are stable against diffusion at room temperature (and above). The deposition of size-selected metal clusters represents a novel method of preparing surface nanostructures, with potential applications including model catalyst studies and the immobilization of biological molecules.