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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

Experimental and quantum chemical studies of structure and reaction mechanisms of dioxouranium(VI) complexes in

Valérie Vallet1, Zoltán Szabó, Ingmar Grenthe

  • 1Laboratoire de Physique des Lasers Atomes et Molecules, UMR CNRS 8523, CERLA, FEDER 2416, Universite des Sciences et Technologies de Lille, F-59655 Villeneuve d'Ascq, France. valerie.vallet@univ-lille1.fr

Dalton Transactions (Cambridge, England : 2003)
|November 13, 2004
PubMed

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