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Preparation of Monodomain Liquid Crystal Elastomers and Liquid Crystal Elastomer Nanocomposites
Published on: February 6, 2016
Fluorinated polymers: liquid crystalline properties and applications in lithography
Sitaraman Krishnan1, Young-Je Kwark, Christopher K Ober
1Materials Science and Engineering, Cornell University, 310 Bard Hall, Ithaca, NY 14853, USA.
Chemical Record (New York, N.Y.)
|November 16, 2004
Summary
This study reviews fluorinated polymers, highlighting their unique properties like self-assembly and low surface energy. Applications in advanced technologies, including photoresists for 157 nm lithography, are discussed.
Area of Science:
- Materials Science
- Polymer Chemistry
Background:
- Fluorinated polymers exhibit unique properties such as self-assembly, low surface energy, and low UV absorbance.
- These properties make them suitable for advanced technology applications.
Purpose of the Study:
- To review the synthesis and characterization of block copolymers with fluorinated side chains.
- To emphasize the surface properties of these fluorinated polymers.
- To discuss their application as photoresists for 157 nm lithography and processing in supercritical carbon dioxide.
Main Methods:
- Synthesis and characterization of block copolymers.
- Surface analysis techniques.
- Evaluation of photoresist performance.
Main Results:
- Demonstrated successful synthesis of fluorinated block copolymers.
- Characterized unique surface properties arising from fluorinated side chains.
- Showcased potential for 157 nm photoresist applications.
Conclusions:
- Fluorinated polymers offer versatile properties for advanced materials.
- Block copolymers with fluorinated side chains are promising for surface engineering.
- Environmentally friendly processing in supercritical carbon dioxide is feasible for these materials.
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