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Updated: Aug 9, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Chemical surface passivation of Ge nanowires
Tobias Hanrath1, Brian A Korgel
1Department of Chemical Engineering, Texas Materials Institute, Center for Nano- and Molecular Science and Technology, The University of Texas at Austin, Austin, TX 78712-1062, USA.
Abstract:
Surface oxidation and chemical passivation of single-crystal Ge nanowires with diameters ranging between 7 and 25 nm were studied. The surface chemistry differs significantly from that of well-studied monolithic atomically smooth single-crystal substrates. High-resolution Ge 3d XPS measurements reveal that Ge nanowires with chemically untreated surfaces exhibit greater susceptibility to oxidation than monolithic Ge substrates. Multiple solution-phase routes to Ge nanowire surface passivation were studied, including sulfidation, hydride and chloride termination, and organic monolayer passivation. Etching in HCl results in chloride-terminated surfaces, whereas HF etching leads to hydride termination with limited stability. Exposure to aqueous ammonium sulfide solutions leads to a thick glassy germanium sulfide layer. Thermally initiated hydrogermylation reactions with alkenes produce chemically stable, covalently bonded organic monolayer coatings that enable ohmic electrical contacts to be made to the nanowires.

