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In Situ Time-dependent Dielectric Breakdown in the Transmission Electron Microscope: A Possibility to Understand the Failure Mechanism in Microelectronic Devices
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Rapid and localized electron internal-transport-barrier formation during shear inversion in fully noninductive TCV

M A Henderson1, Y Camenen, S Coda

  • 1Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, Association EURATOM, Confédération Suisse, CH-1015 Lausanne, Switzerland.

Physical Review Letters
|December 17, 2004
PubMed

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