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Related Experiment Videos

Novel polymer patterns formed by lithographically induced self-assembly (LISA).

Lei Chen1, Lei Zhuang, Paru Deshpande

  • 1NanoStructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, NJ 08544, USA. lchen@nanoopto.com

Langmuir : the ACS Journal of Surfaces and Colloids
|January 26, 2005
PubMed
Summary

Lithographically induced self-assembly (LISA) creates diverse polymer thin film patterns like rods and pillars. Hydrogen bonding in polymers and mask topology significantly influence pattern formation and transformation.

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Area of Science:

  • Polymer Science
  • Materials Science
  • Nanotechnology

Background:

  • Lithographically induced self-assembly (LISA) is a technique used to create ordered patterns in polymer thin films.
  • Controlling pattern formation in LISA is crucial for various applications, but it is influenced by multiple operational factors.
  • Understanding the role of polymer chemistry and processing conditions is key to tailoring self-assembly outcomes.

Purpose of the Study:

  • To investigate the influence of polymer chemistry, specifically incorporating inter- and intramolecular hydrogen bonds, on LISA patterns.
  • To explore how mask topology affects the formation and propagation of self-assembled structures.
  • To determine the effect of process temperature on the transformation of different LISA patterns.

Main Methods:

Related Experiment Videos

  • Utilized lithographically induced self-assembly (LISA) with different polymer compositions, including poly(methyl methacrylate) and poly(methyl methacrylate-co-methacrylic acid).
  • Employed various mask topologies, such as plain and patterned masks with protrusions.
  • Varied process temperatures and controlled surface tension during the self-assembly process.

Main Results:

  • Achieved diverse self-assembly patterns including concentric rings, rods, and pillars in polymer thin films.
  • Incorporating hydrogen bonding in poly(methyl methacrylate-co-methacrylic acid) led to novel rod and array patterns, unlike the pillar arrays in poly(methyl methacrylate).
  • Mask topology dictated rod array formation: defects initiated outward propagation under plain masks, while protrusions guided inward propagation.

Conclusions:

  • Polymer chemistry, particularly hydrogen bonding, and mask topology are critical factors in controlling LISA patterns.
  • Novel rod and array structures can be generated by introducing specific polymer interactions and mask designs.
  • Process temperature offers a means to reversibly transform between different self-assembled morphologies, such as rods and pillars.