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Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask
Jinwon Sung1, Heidi Hockel, Eric G Johnson
1College of Optics and Photonics, CREOL & FPCE, University of Central Florida, Orlando, Florida 32816-2700, USA.
Optics Letters
|January 29, 2005
Summary
Phase-mask technology enables analog micro-optics fabrication. A pi phase-depth grating mask precisely controls exposure intensity, allowing variable photoresist thickness for creating micro-optical elements.
Area of Science:
- Microfabrication
- Optics and Photonics
- Materials Science
Background:
- Analog micro-optics fabrication presents challenges in achieving precise thickness control.
- Traditional photolithography often results in binary profiles, limiting analog optical function.
Purpose of the Study:
- To investigate phase-mask technology for analog micro-optics fabrication using thick photoresist.
- To demonstrate the capability of a 2D phase-grating mask to control photoresist thickness analogously.
Main Methods:
- Simulated, designed, and fabricated a 2D phase-grating mask with pi phase depth.
- Utilized a photolithographic stepper for exposure of thick SPR-220 photoresist.
- Developed the exposed photoresist to reveal the analog micro-optics profile.
Main Results:
- The 2D phase-grating mask successfully produced analog variations in exposure intensity.
- Variable photoresist thickness was achieved, creating the desired analog micro-optics profile.
- Demonstrated the fabrication of analog micro-optics in thick SPR-220 photoresist.
Conclusions:
- Phase-mask technology is a viable method for analog micro-optics fabrication.
- The use of a pi phase-depth grating mask offers precise control over photoresist thickness.
- This technique enables the creation of complex analog micro-optical elements with thick photoresist materials.