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Updated: Aug 18, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Lithography with a focused soft X-ray beam and a monomolecular resist

Ruth Klauser, Mao-Lin Huang, Shih-Chieh Wang

    Langmuir : the ACS Journal of Surfaces and Colloids
    |April 20, 2005
    PubMed
    Abstract

    No abstract available in PubMed .

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