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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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K5(UO2)2[Si4O12(OH)]: a uranyl silicate containing chains of four silicate tetrahedra linked by SiO...HOSi hydrogen

Chih-Shan Chen1, Hsien-Ming Kao, Kwang-Hwa Lii

  • 1Department of Chemistry, National Central University, Chungli, Taiwan 3209, ROC.

Inorganic Chemistry
|April 30, 2005
PubMed

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