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A simplified predictive control algorithm for disturbance rejection.

Futao Zhao1, Yash P Gupta

  • 1Department of Chemical Engineering, Dalhousie University, Halifax, Canada, NS B3J 1Z1.

ISA Transactions
|May 5, 2005
PubMed
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This study introduces a simple disturbance predictor (SDP) to improve model predictive control (MPC) for chemical processes. The SDP enhances disturbance suppression, leading to better regulatory performance and zero offset.

Area of Science:

  • Chemical Engineering
  • Process Control
  • Control Systems

Background:

  • Model Predictive Control (MPC) is widely used in chemical processes.
  • Standard MPC struggles with unmodeled deterministic disturbances due to prediction horizon limitations.
  • Effective disturbance suppression is crucial for process stability and performance.

Purpose of the Study:

  • To develop a Simple Disturbance Predictor (SDP) for enhancing MPC performance.
  • To address the limitations of standard MPC in handling dynamic disturbances.
  • To improve the regulatory performance of chemical processes under disturbances.

Main Methods:

  • Developed a Simple Disturbance Predictor (SDP) using curve fitting of historical data.
  • Integrated the SDP with a simplified Model Predictive Control (MPC) algorithm.

Related Experiment Videos

  • Employed a tuning parameter for adaptability to various disturbance dynamics.
  • Presented an online procedure for optimizing the tuning parameter.

    • Main Results:

    • The proposed SDP significantly improved regulatory performance compared to standard MPC.
    • Achieved zero offset for both regular and ramp output disturbances.
    • Demonstrated effectiveness across three distinct example problems.
    • The tuning parameter effectively adapted to different disturbance dynamics.

    Conclusions:

    • The Simple Disturbance Predictor (SDP) is an effective enhancement for Model Predictive Control (MPC).
    • SDP improves disturbance rejection capabilities, leading to superior process control.
    • The method offers a practical solution for achieving zero offset in chemical process control.