Preparing contamination-free mica substrates for surface characterization, force measurements, and imaging

Due to its perfect cleavage that provides large areas of molecularly smooth, chemically inert surfaces, mica is the most commonly used natural substrate in measurements with the surface forces apparatus (SFA), in atomic force microscopy (AFM), and in many adsorption studies. However, preparing mica surfaces that are truly clean is not easy since mica is a high-energy surface that readily adsorbs water, organic contaminants, and gases from the atmosphere. Mica can also become charged on cleaving, which makes it prone to picking up oppositely charged particles or mica flakes from the surroundings. High refractive index particles, such as metals, will adhere to mica through van der Waals forces. Recent articles have demonstrated that particle contamination is obtained when inappropriate cutting and handling procedures for the mica are used. In this paper, we show that both particle and other critical contamination is easy to detect and provide proper steps to take during the sample preparation process.