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Photonic band gap templating using optical interference lithography.

Timothy Y M Chan1, Ovidiu Toader, Sajeev John

  • 1Department of Physics, University of Toronto, 60 St. George Street, Toronto, Ontario, M5S 1A7, Canada.

Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics
|May 21, 2005
PubMed
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We developed novel photonic band-gap (PBG) materials using laser interference lithography. The body-centered cubic structure shows the highest robustness for creating these advanced optical materials.

Area of Science:

  • Materials Science
  • Optics
  • Nanotechnology

Background:

  • Photonic band-gap (PBG) materials are crucial for controlling light propagation.
  • Fabricating complex PBG structures with large band gaps remains a challenge.

Purpose of the Study:

  • To design and characterize novel inversion-symmetric PBG template architectures using laser interference.
  • To synthesize PBG materials from these templates with high optical performance and robustness.

Main Methods:

  • Utilizing four-beam laser interference patterns to define iso-intensity surfaces for template fabrication.
  • Employing holographic lithography in polymer photo-resist for template creation.
  • Synthesizing PBG materials through two-stage infiltration and inversion (silica then silicon).

Related Experiment Videos

  • Analyzing crystal structures (fcc, bcc, sc) based on point and space group symmetries.

    • Main Results:

    • Achieved PBG to center frequency ratios of 25% (fcc), 21% (bcc), and 11% (sc) for silicon-air structures.
    • Demonstrated a full PBG for the diamond-like (fcc) crystal with a refractive index contrast > 1.97.
    • Identified a novel body-centered cubic (bcc) architecture with maximum robustness against perturbations.
    • Illustrated a non-inversion symmetric PBG with two complete band gaps and generalized tetragonal structures.

    Conclusions:

    • Laser interference lithography provides a versatile route to engineer diverse PBG architectures.
    • The bcc structure offers superior robustness, making it promising for practical applications.
    • Optimized laser parameters enhance lithography robustness and material performance.