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Updated: Aug 17, 2026

Building Langmuir Probes and Emissive Probes for Plasma Potential Measurements in Low Pressure, Low Temperature Plasmas
Published on: May 25, 2021
Radio frequency glow discharge source with integrated voltage and current probes used for sputtering rate and
L Wilken1, V Hoffmann, K Wetzig
1Leibniz Institute for Solid State and Materials Research Dresden, P.O. Box 270116, 01171 Dresden, Germany. l.wilken@ifw-dresden.de
Abstract:
Radio frequency glow discharge optical emission spectroscopy (RF-GD-OES) is routinely used for the chemical analysis of solid samples. Two independent electrical signals from the discharge are required for quantification. When sputtering insulating samples, the voltage over the discharge is not directly measurable. The coupling capacity of the sample is required in order to calculate the discharge voltage. A procedure is outlined where the coupling capacity is determined using an electrical measurement without discharge. The calculated time-dependent discharge voltage and current are evaluated using a plasma equivalent circuit. An insulating sample is sputtered at constant cathode voltage and current. The emission yield for an aluminium line is comparable to that of conducting reference material.
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